Meaning
Ultra high purity inert gas with a minimum purity of ninety nine point nine nine nine nine percent is specified for the most sensitive semiconductor manufacturing and advanced analytical applications. Utilizing grade 6 argon minimizes the risk of defect generation in silicon wafer processing. The total impurity level is constrained to less than one part per million, representing an order of magnitude increase in purity over standard industrial grades.
Purification Method
Catalytic purification and cryodistillation processes remove trace oxygen, nitrogen, carbon dioxide, and hydrocarbons from the raw gas stream. The process takes place in dedicated air separation units designed to prevent any external air ingress. This high level of purification ensures that the resulting grade 6 argon meets the stringent demands of modern nanotechnology.
Impurity Budget
Individual contaminants within the gas are kept at sub part per million levels to prevent deposition on sensitive surfaces. Oxygen and moisture are typically limited to less than zero point two parts per million each.
Gas Handling
Specialized distribution systems utilizing electropolished tubing and orbitally welded joints are required to transport the gas to the point of use. Normal copper or standard stainless steel pipes would release contaminants and ruin the high purity. Double stage regulators with metal diaphragms prevent atmospheric diffusion through the regulator seals, which is necessary because even a tiny leak would degrade the grade 6 argon back to a lower tier.